Nanolithography: Flexible patterning of the cellular microenvironment
Source: Small Times
The ability to place individual cells at defined  locations and control their microenvironment has numerous applications  in the field of cell biology.  Cells respond to their microenvironment and the resulting extracellular  signals [1, 2]. The ability to control the cellular microenvironment  enables investigation of biochemical and topological cues on various  cell behavior, such as cell adhesion, differentiation, and molecular  signaling pathways.
The nanolithography platform, NLP 2000, was designed to provide a simple solution to  achieve high precision placement of nano- to micro-sized features with  nanoscale precision. The process of deposition of material is based on  Dip Pen Nanolithography (DPN), an established method of nanofabrication  in which materials are deposited onto a surface using a sharp tip [9,  10]. The tool is capable of patterning a wide range of materials with  feature sizes from 50nm to 10µm over an area of 40 x 40mm. The features  can be placed with nanoscale precision using a three-axis closed-loop  stage.

Nanolithography: Flexible patterning of the cellular microenvironment

Source: Small Times

The ability to place individual cells at defined locations and control their microenvironment has numerous applications in the field of cell biology. Cells respond to their microenvironment and the resulting extracellular signals [1, 2]. The ability to control the cellular microenvironment enables investigation of biochemical and topological cues on various cell behavior, such as cell adhesion, differentiation, and molecular signaling pathways.

The nanolithography platform, NLP 2000, was designed to provide a simple solution to achieve high precision placement of nano- to micro-sized features with nanoscale precision. The process of deposition of material is based on Dip Pen Nanolithography (DPN), an established method of nanofabrication in which materials are deposited onto a surface using a sharp tip [9, 10]. The tool is capable of patterning a wide range of materials with feature sizes from 50nm to 10µm over an area of 40 x 40mm. The features can be placed with nanoscale precision using a three-axis closed-loop stage.

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